*** This version of Confluence is for testing only and contains a copy of content from June 29th 2026. No changes will be preserved. ***
-
Created by
David William Botsch on Jul 25, 2016
1 minute read
Manuals and Guides
Supplementary Files
User Recipes
SUBSTRATE: Standard 500um single-side-polished 4“ Si wafers
SOURCE: Basline etch wafer recipe from AFS:Fellows
ADDED: 2/22/13
Spin P20 at 3000 rpm for 30s. Spin Shipley 1827 resist at 3000 rpm for 30s. Softbake 115 C, 60 seconds.
Expose on the ABM 12 seconds (with 365nm and 405nm mirrors). Develop in Hamatech automated developer, using process “300 MIF 90s.”