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Created by
David William Botsch on Jul 25, 2016
1 minute read
Supplementary Files
- UV Cure Characterization for Ion Implantation
- SOURCE: Janet Shen (AFS)
DATE: 12/10/09
- [LINK TO IMPLANTER DATA ON AFS:STAFF, IT'S A HUGE FILE]
A SIMS analysis of an Arsenic implant into silicon with a dose of 5E15 at a beam energy of 150 KEV.
A SIMS analysis of an Phosphorous implant into silicon with a dose of 5E15 at a beam energy of 100 KEV.