UPDATES:

• Kathryn McGill (CNF Fellow)

1. spin 4% 495 @ 3000 rpm, 1000 ramp, 60 s (resist will be ~150 nm thick)
   • bake @ 170 °C for 15 min
2. spin 2% 950 @ 3000 rpm, 1000 ramp, 60 s (resist will be ~50 nm thick)
   • bake @ 170 °C for 15 min

1. Measure the current in pA for all apertures you are going to use (typically, 10 µm ap => 30-40 pA & 60 µm ap => ~1000+ pA)
2. Parameters common to all run files (including alignment):
   1. gun @ 20 kV
   2. 900 magnification
   3. general params:

• • • Non-stop writing mode ⇒ yes
    • Disable automated stage control ⇒ no
    • Disable digital SEM control ⇒ no
    • Disable x-y focus mode ⇒ yes
    • Enable global rotation correction ⇒ no

1. alignment windows:
   • counts of 15
   • center-to-center spacing 50 nm
   • line spacing of 50 nm
2. pattern writing of fine features:
   • 10 µm aperture (set in Supra system, not Nabity system)
   • continuous write
   • center-to-center spacing 5 nm
   • line spacing of 5 nm
   • 300 µC/cm^2 area dose
3. pattern writing of large features:
   • 60 µm aperture (set in Supra system, not Nabity system)
   • continuous write
   • center-to-center spacing 30 nm
   • line spacing of 30 nm
   • 500 µC/cm^2 area dose

• 45 sec in 1:3 MIBK:IPA (shake chip back-and-forth in soln) & quench in IPA; N2 dry

Walk-through

step 1 - copy gds file into this directory:

step 2 - right click to convert gds to dc2:

step 2.1 - change drawing unit size to 1 and press convert:

step 3 - right click on new dc2 file and select DesignCAD Express:

step 3.1 - click NPGS - setdump

step 3.1.1 - the dump point is green:

step 3.2 - click NPGS - MaxMag:

step 3.3 - click NPGS - save - exit when done - then re-open to double check dump existence:

step 4 - right click on dc2 - choose run file editor:

step 4.1 - for fine contacts process 2 entities - set params as shown - pattern name is name of dc2 file:

step 4.2 - 1st entity is alignment - set params as shown - insert measured beam current in pA:

step 4.2.1 - skip all non alignment layers:

step 4.3 - 2nd entity for fine contacts - skip all alignment layers - change line to area dose:

step 4.3.1 - enter params as shown - same for each layer! - skip contact pad layer - remember to update measured current

step 4.4 - save run file - extension RF6 - and exit:

step 5 - find run file - right click - process run file:

step 5.1 - click continue - the writing will start!

step 6 - set up contact pad exposure - use these params:

step 6.1 - skip all but contact pad layer - enter params - remember to update measured current - proceed as before: